In This Issue
Participate in Standards Program Survey
Rising Opportunities in Photovoltaic Manufacturing
European Standards Meetings
North America Award Winners
North America Standards Meetings
Japan Standards Meetings
SEMI Korea: New FPD Local Technical Committee
News from Other SDOs: ASTM E56 Committee on Nanotechnology
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From the Director’s Desk
Welcome to the first issue of Standards Watch, a new SEMI electronic newsletter tailored to the world of SEMI Standards! Whether you are looking for updates on the latest strategic moves—the formation of the Manufacturing Technology Forum (MTF)—updates on MEMS and flat panel display activity around the world, or our partnering efforts in the nanotechnology realm, you can find it all here, every other month.
The SEMI International Standards Program, now in its 33rd year, encompasses all aspects of an automated fab and provides a platform for emerging and maturing technologies to reach their full potential. We thank the over 1,500 volunteers and their companies for contributing to critical solutions that help accelerate time to market and reduce manufacturing cost. If you are not a Standards volunteer expert just yet, we hope that this newsletter will change your mind! From our global SEMI Standards team to you – welcome, and happy reading!
Don't miss the SEMI/IEEE Nanoelectronics Standards Workshop on October 31, 2006 at SEMI NanoForum!
SEMI and IEEE, two leading international standards developing organizations, are partnering to ensure the most critical nanotechnology standards are developed quickly. This interactive workshop will provide an overview of the SEMI and IEEE standards programs, global nano standards efforts in both organizations, introduce the IEEE Nanoelectronics Standards Roadmap, and much more. Register Now!
SEMI Pursues ANSI Accreditation
Karel Urbanek Award Bestowed on John Davies and Supika Mashiro
Call for Papers: Frontiers of Characterization and Metrology for Nanoelectronics. Industry, government, and academia unite to present the latest advances related to frontier, state of the art materials and device characterization and metrology.