SEMI Announces 2010 “Best of West” Award Finalists


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SEMI Announces 2010 “Best of West” Award Finalists

Prestigious Panel Recognizes Important Industry Innovations at SEMICON West

SAN JOSE, Calif. – June 17, 2010 – SEMI today announced the finalists for the 2010 “Best of West” awards, recognizing important product and technology developments in the microelectronics supply chain. Held in conjunction with SEMICON West, the largest and most influential microelectronics exposition in North America, the Best of West finalists have been selected based on their financial impact on the industry, engineering or scientific achievement, and/or societal impact.

The 2010 Best of West Finalists are:

  • JVX7200™ SiGe Metrology Tool from Jordan Valley Semiconductors Ltd. combines advanced high-resolution X-ray diffraction (HRXRD) and X-ray reflectivity (XRR) channels to provide composition, thickness, strain, relaxation characterization and metrology for epitaxial layers such as SiGe and SiC, which are required for strained silicon processes. Additionally, the XRR channel can provide valuable information on other thin-films, such as those found in high-k gate stacks. The tool is capable of providing rapid, in-line measurements and analysis on both blanket and product wafers.
  • VHX-1000 Digital Microscope from Keyence Corporation is the first system that integrates the functionality of stereoscopes, metallurgical microscopes, measuring microscopes and scanning electron microscopes into an all-in-one imaging, measuring and report-generating microscope. The VHX-1000 has the ability to quickly and easily capture fully-focused, high-resolution images for analysis, providing solutions for some of the most common difficulties in modern material inspection.
  • NSR-S620D Ultra-High Productivity Immersion Scanner from Nikon Corporation incorporates the Streamlign platform and a 1.35 numerical aperture lens to satisfy the aggressive demands of double patterned lithography at 32 nm, with extendibility to 22 nm applications. The S620D targets 200 wafers per hour, maximizes yield with 2 nm overlay and superior CDU, and enables rapid installation.

The selection of finalists was made by a prestigious panel of judges representing a broad spectrum of the microelectronics industry (a list of judges can be found at www.semiconwest.org/bestofwest).

The Best of West Award winner will be announced during a special ceremony on Wednesday, July 14, 2009 at 1:00pm (TechSITE North, North Hall, Moscone Center).

About SEMI:

SEMI is the global industry association serving the manufacturing supply chains for the microelectronic, display and photovoltaic industries. SEMI member companies are the engine of the future, enabling smarter, faster and more economical products that improve our lives. Since 1970, SEMI has been committed to helping members grow more profitably, create new markets and meet common industry challenges. SEMI maintains offices in Austin, Benguluru, Beijing, Berlin, Brussels, Grenoble, Hsinchu, Moscow, San Jose, Seoul, Shanghai, Singapore, Tokyo, and Washington, D.C. For more information, visit www.semi.org.

Association Contact:

Steve Buehler/SEMI
sbuehler@semi.org

1.408.943.7049