Si2 & SEMI Announce Partnership to Advance Design for Manufacturability in ICs
Si2 AND SEMI ANNOUNCE PARTNERSHIP TO ADVANCE DESIGN FOR MANUFACTURABILITY IN INTEGRATED CIRCUITS
AUSTIN, Texas and SAN JOSE, Calif., April 15, 2005 – The Silicon Integration Initiative (Si2) and SEMI today announced a partnership agreement to address the increasing cost and complexities associated with design for manufacturability of integrated circuits.
As semiconductor design and fabrication becomes increasingly complex, the need for designers, manufacturers and technology providers to collaborate in addressing the difficulties of manufacturing has become more apparent. SEMI members have recognized this need and expressed interest in additional involvement in the area of Design for Manufacturability (DFM). Likewise, the Si2 membership seeks to understand the manufacturing process in more depth in order to develop tools and techniques to create designs that are more robust and create higher yields early in the manufacturing process.
"The issue of design for manufacturing was listed as a primary concern of semiconductor fab managers in a recently-conducted SEMI survey," said Stanley T. Myers, president and CEO of SEMI. "We are pleased to take action on this topic through collaboration with Si2 in order to better meet the needs of SEMI members and their customers. We see important benefits to our respective members through closer coordination among our industry associations."
"The intrinsic problems facing ever-decreasing sub-wavelength ICs have created an economic imperative for the semiconductor industry to shift to the ‘system view’, because isolated flows for design and manufacturing are growing more inefficient," stated Steve Schulz, president and CEO of Si2. "Our member companies recognize this as an industry problem that can only be solved through broad cross-industry collaboration, especially with the types of companies represented by SEMI. We need to develop new standard interfaces, models, and semantics that permit streamlined data integration, opening up new opportunities for competitive solutions and a more efficient industry."
Si2 and SEMI will collaborate in the area of DFM, to provide both of their memberships with added value. The areas served by SEMI and Si2 -- namely tradeshows and standards; and collaborative research and development within EDA, respectively -- are sufficiently distinct from each other that both SEMI and Si2 are able to provide a unique value for each other’s membership by cooperation. A number of both near-term and ongoing term collaboration efforts are planned to accomplish these goals.
Si2 will sponsor technical presentations and coordinate Si2 member participation in the new EDA special exhibit area in the Emerging Technologies Hall of SEMICON West 2005, the premier global semiconductor manufacturing exposition to be held July 12-14, 2005 in San Francisco.
Additionally, a new Design for Manufacturing (DFM) Workshop, to be held in the fall of 2005 at SEMI offices in San Jose, will provide a forum for semiconductor device manufacturing executives, chip designers, EDA suppliers and equipment company executives to collaborate on DFM issues.
Finally, SEMI will participate in upcoming EDA events in partnership with Si2, such as the Design Automation Conference to be held in Anaheim in mid-June of this year and other areas of collaboration are currently being discussed.
SEMI is a global industry association serving companies that develop and provide manufacturing technology, materials and services used to make semiconductors, flat panel displays (FPDs), micro-electromechanical systems (MEMS) and related microelectronics. SEMI maintains offices and hosts programs and activities in every major microelectronics and display manufacturing region around the world
Si2 is an organization of over 70 industry-leading semiconductor, systems, EDA and manufacturing companies focused on improving the way integrated circuits are designed and manufactured in order to speed time-to-market, reduce costs, and meet the challenges of sub-micron design. Si2 is uniquely positioned to enable collaboration through a strong implementation focus.
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