SEMI Announces Challenges in Device Scaling TechXPOT at SEMICON West 2006
SAN JOSE, Calif. – May 10, 2006 – Scaling of semiconductor circuit features to ever-smaller dimensions is essential to keeping pace with the International Technology Roadmap for Semiconductors (ITRS) and adhering to Moore’s Law. The industry will learn about solutions to these and other hot-button issues at the Challenges in Device Scaling TechXPOT, which will be held during SEMICON West 2006, July 11-13 at the Moscone Center in San Francisco.
Maintaining the “show-within-the-show” concept, the Challenges in Device Scaling TechXPOT offers targeted content and sessions focusing on the equipment and materials challenges facing the semiconductor industry, as it develops the devices and processes necessary for the 45 and 32nm ITRS nodes. The Challenges in Device Scaling TechXPOT will be located in the North Hall of the Moscone Center.
“The intent of the TechXPOTs in general, is to bring highly focused and relevant content to SEMICON West attendees,” said Ralph Kirk, technical director of North America Programs at SEMI. “By segmenting SEMICON West into technical focus areas, we are creating dedicated locations that highlight similar innovative technologies, thereby allowing attendees to make more efficient use of their time at the expo.”
The area will feature sessions focusing on a range of topics including mask challenges, featuring Brian Grenon of Grenon Consulting, Inc.; engineered substrates, featuring Mayank Bulsara, president of Atlas Technology; and interconnects and processes for advanced devices, featuring Ken Monnig, former associate director of Interconnect at International SEMATECH. SEMI will co-sponsor the DNS Lithography Breakfast Forum as a Device Scaling TechXPOT satellite session. The event will take place at 7:30am, Wednesday, July 12 at the San Francisco Marriott, and will feature George Petricich, vice president of product marketing at DNS Electronics as the Session Chair.
The final sessions will deal with advanced metrology, one focusing on tools needed to support advances in lithography, chaired by Stephen Knight., director of the Electronics and Electrical Engineering Laboratory, Office of Microelectronics Programs at NIST and the second focusing on tools for identifying defects, and characterizing thin films.
“There are many challenges to realizing 45 and 32 nm processing technologies,” said Kirk. “Visitors to the Device Scaling TechXPOT will learn about, and further explore these issues, and then, they can speak directly with the people who are developing the solutions.”
TIS 2006 winners in from the Device Scaling TechXPOT will present on the Manufacturing Productivity & Effectiveness TechXPOT stage in the Esplanade. Companies selected for products dealing with front-end processing include: Accretech, Actinix, Advanced Electron Beams, Inc., Cabot Microelectronics, Digmesa, Filmetrics, Inc., Metrosol, Inc., MultiMetrixs, LLC, Neocera, Inc. and RASIRC.
For more information about the Challenges in Device Scaling TechXPOT, as well as SEMICON West 2006, please visit www.semi.org/semiconwest.
SEMI is a global industry association serving companies that provide equipment, materials and services used to manufacture semiconductors, displays, nano-scaled structures, micro-electromechanical systems (MEMS) and related technologies. SEMI maintains offices in Austin, Beijing, Brussels, Hsinchu, Moscow, San Jose (California), Seoul, Shanghai, Singapore, Tokyo and Washington, D.C. For more information, visit www.semi.org.
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