Keynote Speakers and Programs Announced for SEMICON West 2006
KEYNOTE SPEAKERS AND PROGRAMS ANNOUNCED FOR SEMICON WEST 2006
Exposition Features Wide Range of Keynote Speakers and Technology Short Courses
SAN JOSE, Calif. – May 30, 2006 – SEMI today announced the lineup of keynote speakers and program highlights for SEMICON West 2006, which takes places at the Moscone Center in San Francisco, California, July 10-14. Executives from STMicroelectronics, Micron, Mentor Graphics, Xilinx, LogicVision, and Surfect Technologies are among the keynote speakers scheduled to present at the exposition. In addition, the expo will feature a number of short courses, sponsored by IEEE/CPMT, Pinnacle Training International (PTI), SEMI, the International Society for Optical Engineering (SPIE), and the Standards Technology Group (STG), as well as a series of Standards Technical Education Program (STEP) courses.
A SEMI Market Symposium keynote on July 10 entitled “Design for Manufacturing: Changing Future Directions in Semiconductor Manufacturing Equipment Cost and Capability,” will feature Wally Rhines, chairman and CEO, Mentor Graphics. Laurent Bosson, executive vice president of front-end technology and manufacturing, STMicroelectronics, will deliver the opening keynote address for SEMICON West 2006 on Tuesday, July 11, at 10:00am.
Other keynote topics and speakers for the event include “Fabless 2.0: A New Model for Success at 65nm and Below,” featuring Willem Roelandts, president, CEO and chairman, Xilinx; “Testing the Chips of Tomorrow Without Going Broke,” featuring Jim Healy, president and CEO, LogicVision; and “Wafer Level Interconnect: Flip Chip and Beyond for High-Performance and Consumer Electronics,” featuring Steve Anderson, CEO, Surfect Technologies. Steve Appleton, chairman, CEO and president of Micron, will look at the viability of industry cooperation in his presentation, "Partnerships: Fact or Fiction?"
SEMICON West 2006 will also offer a comprehensive curriculum of short courses focusing on numerous areas of technology, such as advanced packaging, advanced design methodologies, nanotechnology and MEMS, deposition and etch, optical lithography, semiconductor account selling and standards.
“SEMICON West offers a wide range of dynamic and interactive programs and keynotes featuring many of the industry’s leading executives, drawing professionals from around the world,” said Vicki Hadfield, president of SEMI North America. “We continue to add value to the exposition through new features such as the technology segmented TechXPOTs and by providing a rich forum for education, networking and information exchange.”
All keynotes will take place on the SEMICON West Center Stage, West Hall, Level 2, except as noted. Keynotes are free of charge and open to registered attendees of SEMICON West 2006, with the exception of the SEMI Market Symposium keynote, which is open only to paid symposium registrants.
Monday, July 10
Wally Rhines, Mentor Graphics – 1:00pm-2:00pm, San Francisco Marriott Hotel (SEMI Market Symposium keynote; presented by SEMI and Gartner)
Tuesday, July 11
Laurent Bosson, STMicroelectronics – 10:00am–11:00am
Jim Healy, LogicVision – 1:00p.m.-1:45p.m.
Steve Anderson, Surfect Technologies – 1:45pm–2:30pm
Wednesday, July 12
Willem Roelandts, Xilinx – 10:00am–11:00am
Steve Appleton, Micron – 1:00pm–2:00pm
For more detailed information about keynote speaker addresses, technical programs and short courses, or to register to attend the exposition, please visit www.semi.org/semiconwest, or contact Scott Smith, SEMI U.S. public relations at 1.408.943.7957 (firstname.lastname@example.org.)
SEMI is a global industry association serving companies that provide equipment, materials and services used to manufacture semiconductors, displays, nano-scaled structures, micro-electromechanical systems (MEMS) and related technologies. SEMI maintains offices in Austin, Beijing, Brussels, Hsinchu, Moscow, San Jose (California), Seoul, Shanghai, Singapore, Tokyo and Washington, D.C. For more information, visit www.semi.org.
Scott Smith/SEMI U.S.
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