Farhang Shadman Wins 3rd Akira Inoue Award
Farhang Shadman Wins 3rd Annual Akira Inoue Award for Environmental, Health and Safety Leadership
Farhang Shadman and Tetsuro Higashi, CEO and president of Tokyo Electron Ltd.
Dennuosuke Uchida, president of SEMI Japan; Tadahiro Ohmi, professor, Tohoku University; and Farhang Shadman
Photos courtesy of Dr. Ara Philipossian, Uni. of Arizona
Farhang Shadman, Director of the Engineering Research Center for Environmentally Benign Semiconductor Manufacturing at the University of Arizona, was named the 2002 recipient of the Akira Inoue Award for Outstanding Achievement in environment, health and safety in the semiconductor industry.
Among the factors cited for Dr. Shadman’s selection by the Akira Inoue Award Committee were:
- His initiative in establishing in 1995 the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing, which is funded by the National Science Foundation, the Semiconductor Research Corp., and more than 50 semiconductor and related companies.
- Developing, in conjunction with International SEMATECH, novel water recycling methods based on membrane technology. These programs have been successfully commercialized, resulting in a 25 to 70 percent reduction in water usage per wafer fab and significant savings in operating costs.
- His role as an educator -- having supervised more than 50 graduate students and post-doctoral fellows -- and his work in developing educational programs for U.S. and foreign professionals on different aspects of semiconductor materials processing.
The awards committee also praised Dr. Shadman's use of the "design for environment" approach in which environmental factors can be drivers for the development of new and cost effective semiconductor processing technologies.
Dr. Shadman’s work was praised by Craig R. Barrett, CEO of Intel Corp., who was last year’s recipient of the Akira Inoue Award. "Professor Shadman's technical contributions in the specific areas of reactive membrane technology, ultra purification of liquids, and process simulation for water use reduction are all well known and highly regarded in the industry," said Barrett. "To his credit, he recognized the need for research in these areas well in advance of the commercial need, and proceeded to lay the technical foundation."
Dr. Shadman has been a professor in the Department of Chemical and Environmental Engineering at Arizona University since 1979. From 1991 to 1995 he served as director of the ISMT Center of Excellence on Contamination and Defect Control. In October 2000 Dr. Shadman received the Landmark Innovation Award from the Semiconductor Research Corporation (SRC) and in April 1998 he received the Excellence in Research Award, jointly presented by SRC, ISMT and the Semiconductor Industry Association.
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