Laminera LLC
Apr 6, 2023
1159057
Semiconductor chip fabrication heavily relies on plasma-based approaches for low-temperature and novel chemistry processing but is also hindered by the contamination of ceramics in plasma sources and damage caused by some plasma species, mainly ions. Laminera is pursuing a hollow cathode-based plasma approach to avoid contamination and is proposing work to develop components to optimize for neutral radical species from the hollow cathode source that do not damage sensitive materials and electronic devices as ions do. Laminera plans to develop this technology into a 200 mm and 300 mm wafer scale deposition and etch tools for R&D and production fabrication facilities all around the world as the technology being developed has a strong chance at being a key enabler for future electronic devices including those that use 2D materials and nitrides.
Primary Industry
Semiconductor
Primary Product Category
Equipment and Sub-Systems
Primary Product Sub Category
Deposition
Website
1 Cyclotron Road
MS67R3210S
Berkeley
CA
94720