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Improvements in semiconductor performance continue to be made, largely driven by advances in optical lithography equipment, photomask, and photoresist (resist) materials. In particular, the design and development of photoresists that are sensitive to short exposure wavelengths have enabled the industry to migrate to smaller device sizes. Photoresist allows precise pattern formation upon exposure to light through a template called a photomask and subsequent etching of portions of the photoresist, resulting in the permanent transfer of patterns to the wafer substrate.

The SEMI Industry Research and Statistics Group provides market data and research reports covering semiconductor materials, packaging materials, and fabs. We collect actual data from suppliers around the world following strict professional standards of confidentiality. Our reports help the industry make important investment, strategic and planning decisions by providing timely and accurate market research and market forecasting programs. For more information, visit www.semi.org/marketinfo or contact the SEMI Industry Research and Statistics Group at mktstats@semi.org

 

Keywords: Substrate, Market Research, Fabrication, Materials, Packaging, Investment, Forecast, Optical, Lithography, Photoresist, Etching