International Women’s Day (IWD) is a global day celebrating the social, economic, cultural and political achievements of women. The day is not only the centerpiece of the movement for women’s rights but a unique opportunity to recognize the contributions of women to the semiconductor industry. The first International Women’s Day took place in 1911 when more than a million people in Austria, Denmark, Germany and Switzerland marched to demand equal rights for women including the right to vote and to protest employment sex discrimination. In 1977, the United Nations General Assembly invited member states to proclaim March 8 the UN Day for women's rights and world peace.
In recent years, organizations and companies worldwide have sought to use IWD to celebrate the contributions of women to our homes, families, workplaces and communities. The IWD theme for 2021 is Choose to Challenge – a call to draw attention to women’s inequality. It’s also an excellent opportunity for all SEMI members to choose to challenge deep-rooted thinking and behavior in order to grow diversity and collectively commit to increasing the representation of women and women-owned businesses in the semiconductor industry.
The double-edged challenge for the chip industry is to grow the ranks of women while retaining those now in the workforce. One in four women are considering leaving their workplaces or downshifting their careers due to work-life challenges stemming from COVID-19, SEMI noted in a recent blog highlighting the Women in the Workplace 2020 study by McKinsey & Company and LeanIn.org. One in four! In 2021 it’s important for us to recognize and work to reverse this trend by taking time to encourage, support and celebrate women in the face of COVID-19.
A shining example of the enormous contributions to semiconductor industry by women is Dr. Suvi Haukka, a pioneer of atomic layer deposition (ALD) technology. Thirty years ago, Dr. Haukka spied a small note on a university noticeboard that led to her pursuit of a long and highly distinguished career in our industry. The note was a job opportunity with ASM International to research ALD, a role she landed. Upon joining ASM, Dr. Haukka investigated the use of ALD for catalysis applications to modify porous high-surface area materials used in oil refining and polymerization.
What was initially a niche application to modify the surfaces of microporous substances and silicon solar cells evolved over time to become a critical materials technology and manufacturing method for coating semiconductor wafers. Working systematically in the lab, Dr. Haukka and her coworkers made fundamental materials and manufacturing process discoveries that advanced ALD material science and manufacturing technologies.
An accomplished inventor and technical contributor, Dr. Suvi Haukka was named ASM’s very first Fellow of the Technical Staff in 2018.
“Being named an ASM Fellow was a huge moment that made me very, very proud,” Dr. Haukka said. “I have spent my entire professional career working with ALD, and I have been very fortunate to work with many talented colleagues at ASM.
“Together we have dedicated ourselves to introducing ALD as a standard means of manufacturing in the semiconductor industry. I believe the award is in recognition of all the valuable work we’ve done over the years.”
Dr. Haukka is ASM’s most prolific inventor with more than 100 patents to her name. Her remarkable contributions to the development of ALD chemistry and semiconductor manufacturing process technologies over her three-decade career have made her a highly respected, internationally recognized researcher in the semiconductor manufacturing industry.
