Wooptix SL, a Spanish company dedicated to developing advanced imaging solutions for the semiconductor industry, will be presenting a new technique for Patterned Wafer Geometry at the upcoming SPIE Advanced Lithography conference on February 28th, 2022, in a paper published together with Applied Materials. The flatness of the silicon wafer used to manufacture integrated circuits is controlled to tight tolerances to ensure the full wafer is sufficiently flat for lithographic processing. In recent years, a metrology tool based on double Fizeau interferometry has been used to generate wafer geometry maps to correct for process induced focus issues and overlay problems. In the upcoming paper, WFPI is used successfully on patterned silicon wafers to acquire 7.65 million data points in 5 seconds on the full 300mm patterned wafer with a lateral resolution of 96µm to generate the wafer shape.
About Wooptix
Based in La Laguna Tenerife, Canary Islands, Wooptix is founded on decades of optical research done at the astrophysics department at La Laguna University in conjunction with Teide Observatory in Tenerife, one of the world’s most important astronomy research centers. Wooptix, being a venture funded company and an Intel Capital portfolio company, has used the venture funds to develop Phemet and bring it to commercialization for semiconductor the lab market and is currently in the early stages of bringing the technique in to a fully automated fab tool.