Christoph Hensche, SVP Semiconductor Mask Solutions at ZEISS, discusses the invention of EUVL in 1985 as well as the first customers and readiness of infrastructure for EUV mask manufacturing. ZEISS has already addressed many of the challenges EUV mask making faces, including defectivity, registration metrology, mask tuning, mask repair, and mask verification. Their SMT fab lab in Oberkochen, Germany is being expanded as innovation continues. From SEMICON Japan in December 2018 in Tokyo.
Keywords: EUV, Fabrication, Defects, Lithography, Metrology