KC CO., LTD.
Jun 15, 1994
6314
KCTech, founded in 1987, have contributed to domestic Semiconductor and FPD industry through localization of related items including equipments and electric materials. And responding to unpredictable market situation we have created varying product line from polishing powder to CMP equipment. Now we KCTech have a goal named a global leading company with value creating through seamless innovation and dedicated R&D.Semiconductor - CMP:Chemical Mechanical Polishing Semiconductor equipment - Wafer Cleaner:Etching, Delamination, Particle removal equipment - Gas Cabinet:Gas supply Eqipment - Slurry:Semiconductor planarization polishing consumable materials used in the processFPD - Wet station:Wet chemical process equipment(Etcher,Developer,Stripper,Cleaner) - Coater:PR(Photo Resist) Coating equipmemt before exposure process - APP:Atmospheric plasma cleaning device
Primary Industry
Semiconductor
Primary Product Category
Equipment and Sub-Systems
Primary Product Sub Category
Other
Keywords
GAS, CHEMICAL, CMP, SLURRY, WET, DISPLAY, NANO, COATER, CABINET, MATERIAL
Website
39, Je2gongdan 2-gil, Miyang-myeon
Anseong-si, Gyeonggi-do
17599