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Meeting Metrology and Inspection Requirements as EUVL Ramps Up for 5nm and 3nm

The Advanced Lithography TechXPOT at this year’s SEMICON West will explore progress in extreme ultraviolet lithography (EUVL), its economic viability for high-volume manufacturing (HVM) and other lithography solutions that will address the march to 5nm and onward to 3nm.As a prelude to the event,...

EUV Lithography: Extending the Patterning Roadmap to 3nm

This year’s Advanced Lithography TechXPOT at SEMICON West will explore the progress on extreme ultra-violet lithography (EUVL) and its economic viability for high-volume manufacturing (HVM), as well as other lithography solutions that can address the march to 5nm and onward to 3nm. Several session...