logic

The increasing complexity of IC manufacturing poses a number of challenges including the mask data preparation required to enable technology improvements such as multi-beam (MB) mask writers and extreme ultraviolet (EUV) lithography. Thiago Figueiro, VP of Sales & Marketing of Aselta weighs in.

SEMI spoke with Dr. Mikko Söderlund, sales director for Beneq’s semiconductor business, about trends in Atomic Layer Deposition (ALD) applications. Söderlund shared his views ahead of his presentation at SEMI MEMS & Imaging Sensors Summit, 25-27 September, 2019, at the WTC in Grenoble, France....